SAMCO Inc. manufactures and sells operates as a semiconductor and materials company. The company primarily offers thin film deposition, microfabrication, cleaning, and surface treatment products. Its deposition systems include anode and cathode PECVD systems, atomic layer deposition systems, and silicon carbide (SiC) chemical vapor deposition systems; and etching systems comprise reactive ion etching systems, inductively coupled plasma (ICP) etch systems for general purpose, ICP etch systems for SiC etching, ICP etch systems for batch processing, silicon deep reactive ion etching systems, and XeF2 etch systems for MEMS release. The company also provides cleaning systems consisting of plasma cleaners, remote source plasma cleaners, and UV-ozone cleaners; and basic plasma research kits. It serves MEMS, laser diode, high brightness LED, TSV, SAW device, and RF device markets. The company was formerly known as SAMCO International, Inc. and changed its name to SAMCO Inc. in December 2004. SAMCO Inc. was founded in 1979 and is headquartered in Kyoto, Japan.